[8a-PA4-1~31] Joint Session K "Wide bandgap oxide semiconductor materials and devices"（Poster）

[8a-PA4-22] Mist CVD growth of In₂O₃ films on α–Al₂O₃ using low temperature In₂O₃ buffer layer

〇(M2)Takuya Kobayashi¹, Tomohiro Yamaguchi¹, Takeyoshi Onuma¹, Tohru Honda¹ (1.Kogakuin Univ.)

Keywords:In2O3, mist CVD