The 78th JSAP Autumn Meeting, 2017

Presentation information

Poster presentation

8 Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

Fri. Sep 8, 2017 9:30 AM - 11:30 AM PB4 (P)

9:30 AM - 11:30 AM

[8a-PB4-9] Effect of Substrate Bias on Amino Group Modification onto Fluorocarbon Polymer Surface by He/NH3 Gas Mixture Atmospheric Pressure Plasma Jets

Masahiro Kimpara1, Masaaki Nagatsu1,2,3 (1.Shizuoka Univ., 2.Shizuoka Univ., 3.Shizuoka Univ)

Keywords:plasama, teflon, amino group