[8p-PA2-1~19] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

△ [8p-PA2-4] Alleviation of Extrinsic State and S-factor for Ge Contact by Amorphous Interlayer and N atom

〇Wataru Itaya¹, Kohei Nakae¹, Keisuke Yamamoto¹, Dong Wang¹, Hiroshi Nakashima² (1.Interdisciplinary Graduate School of Engineering Sciences, Kyushu Univ., 2.GIC, Kyushu Univ.)

Keywords:semiconductor