Ryosuke Okuyama

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Speaker, Author, Co-Author

Wed. Mar 15, 2017 9:00 AM - 12:15 PM F201 (F201)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal evaluation, impurities and crystal defects

[15a-F201-1~12] 15.7 Crystal evaluation, impurities and crystal defects

9:00 AM - 9:15 AM

△ [15a-F201-1] Characteristic of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers (1)
-TCAD Analysis of Light Element Trapping and Diffusion Behavior in Projection Range-

〇Ryosuke Okuyama¹, Satoshi Shigematsu¹, Ryo Hirose¹, Ayumi Masada¹, Takeshi Kadono¹, Yoshihiro Koga¹, Hidehiko Okuda¹, Kazunari Kurita¹ (1.SUMCO)