Kazuhiro Karahashi

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Speaker, Author, Co-Author

Fri. Mar 17, 2017 9:00 AM - 11:30 AM 313 (313)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[17a-313-1~10] 8.4 Plasma etching

9:00 AM - 9:15 AM

[17a-313-1] Etching of amorphous carbon layer (a-C) by fluorine and fluorocarbon ions (F⁺, CF⁺, CF₃⁺)

〇Kazuhiro Karahashi¹, Hu Li¹, Kentaro Yamada¹, Tomoko Ito¹, Satoshi Numazawa², Ken Machida², Kiyoshi Ishikawa², Satoshi Hamaguchi¹ (1.Osaka Univ., 2.Samsung R&D Institute Japan)