Kazumi Hogano

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Speaker, Author, Co-Author

Wed. Mar 15, 2017 9:00 AM - 12:15 PM F201 (F201)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal evaluation, impurities and crystal defects

[15a-F201-1~12] 15.7 Crystal evaluation, impurities and crystal defects

10:15 AM - 10:30 AM

△ [15a-F201-6] Fabrication and Property of Surface-Oxygen-Concentration Controlled Ultrathin Silicon Wafers

〇Kazumi Hogano¹, Shotaro Takeuchi¹, Haruo Sudo², Tatsuhiko Aoki², Koji Araki², Koji Izunome², Akira Sakai¹ (1.Osaka Univ., 2.GlobalWafers Japan.)