The 64th JSAP Spring Meeting, 2017

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15 Crystal Engineering » 15.7 Crystal evaluation, impurities and crystal defects

[15a-F201-1~12] 15.7 Crystal evaluation, impurities and crystal defects

Wed. Mar 15, 2017 9:00 AM - 12:15 PM F201 (F201)

Akira Kiyoi(Mitsubishi Electric), Shotaro Takeuchi(Ohsaka Univ.)

10:15 AM - 10:30 AM

△ [15a-F201-6] Fabrication and Property of Surface-Oxygen-Concentration Controlled Ultrathin Silicon Wafers

〇Kazumi Hogano1, Shotaro Takeuchi1, Haruo Sudo2, Tatsuhiko Aoki2, Koji Araki2, Koji Izunome2, Akira Sakai1 (1.Osaka Univ., 2.GlobalWafers Japan.)

Keywords:ultra-thin silicon wafer, wet etching, control of surface-oxygen-concentration