Misaki Nishi

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Speaker, Author, Co-Author

Tue. Mar 14, 2017 1:45 PM - 5:45 PM 502 (502)

Oral presentation
| 21 Joint Session K
| 21.1 Joint Session K

[14p-502-1~15] 21.1 Joint Session K

5:15 PM - 5:30 PM

△ [14p-502-14] Reaction mechanism analysis for fabricating high quality metal oxide thin film by mist CVD (Ⅰ)

〇(B)Misaki Nishi¹, Yuta Suwa¹, Liu Li¹, Phimolphan Rutthongja¹, Dang Gian², Toshiyuki Kawaharamura^1,2 (1.Sys.Eng.Kochi Univ.of Tech, 2.Res.Inst.Kochi Univ.of Tech)

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