Eiji Kamiyama

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Speaker, Author, Co-Author

Tue. Mar 14, 2017 9:15 AM - 12:15 PM F201 (F201)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal evaluation, impurities and crystal defects

[14a-F201-1~11] 15.7 Crystal evaluation, impurities and crystal defects

11:30 AM - 11:45 AM

[14a-F201-9] Influence of anisotropic thermal stress during a Si crystal growth on behavior of the secondary defects

〇Eiji Kamiyama¹, Yoshiaki Abe¹, Hironori Banba¹, Hiroyuki Saito¹, Susumu Maeda¹, Alexander Kuliev², Masaya Iizuka³, Yuji Mukaiyama³, Koji Sueoka⁴ (1.GlobalWafers Japan Co., Ltd., 2.STR Group-Soft Impact, Ltd., 3.STR Japan K. K., 4.Okayama Pref. Univ.)

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