Tomohiro Shiroi

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Speaker, Author, Co-Author

Tue. Mar 14, 2017 1:15 PM - 5:45 PM 316 (316)

Oral presentation
| 6 Thin Films and Surfaces
| 6.5 Surface Physics, Vacuum

[14p-316-1~16] 6.5 Surface Physics, Vacuum

2:15 PM - 2:30 PM

△ [14p-316-5] Pressure Dependence of Rate of Resist Removal using Hydrogen radicals

〇(B)Tomohiro Shiroi¹, Masashi Yamamoto¹, Shiro Nagaoka¹, Tomokazu Shikama¹, Hironobu Umemoto², Keisuke Ohdaira³, Takashi Nishiyama⁴, Hideo Horibe⁴ (1.NIT,Kagawa, 2.Shizuoka Univ., 3.JAIST, 4.Osaka City Univ.)

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