Soichiro Eto

→ Search for Soichiro Eto in Google Scholar

Speaker, Author, Co-Author

Wed. Mar 15, 2017 9:00 AM - 10:45 AM 301 (301)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma measurements and diagnostics

[15a-301-1~7] 8.2 Plasma measurements and diagnostics

9:00 AM - 9:15 AM

[15a-301-1] Estimation of Etching Rate Distribution Using Multiple Optical Emission Spectroscopy

〇Soichiro Eto¹, Takeshi Ohmori¹, Satomi Inoue² (1.Hitachi R&D Group, 2.Hitachi High-Technologies Corp.)