Ripak Park

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Speaker, Author, Co-Author

Wed. Mar 15, 2017 9:00 AM - 11:30 AM 304 (304)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[15a-304-1~10] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

9:15 AM - 9:30 AM

[15a-304-2] Fabrication of Sub10nm mask pattern for stencil lithography techniques using Focused Ion Beam

〇Ripak Park¹, Masao Nagase¹, Yasuhide Ohno¹ (1.Tokushima Univ.)