Ayumi Masada

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Speaker, Author, Co-Author

Wed. Mar 15, 2017 9:00 AM - 12:15 PM F201 (F201)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal evaluation, impurities and crystal defects

[15a-F201-1~12] 15.7 Crystal evaluation, impurities and crystal defects

9:45 AM - 10:00 AM

[15a-F201-4] Characteristics of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers (4)
-The influence of oxygen concentration in implanted region on gettering of metallic impurities (2)-

〇Ayumi Masada¹, Toshiro Nakai¹, Ryo Hirose¹, Satoshi Shigematsu¹, Takeshi Kadono¹, Ryosuke Okuyama¹, Yoshihiro Koga¹, Hidehiko Okuda¹, Kazunari Kurita¹ (1.SUMCO CORPORATION)