TAKESHI KADONO

→ Search for TAKESHI KADONO in Google Scholar

Speaker, Author, Co-Author

Wed. Mar 15, 2017 9:00 AM - 12:15 PM F201 (F201)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal evaluation, impurities and crystal defects

[15a-F201-1~12] 15.7 Crystal evaluation, impurities and crystal defects

10:00 AM - 10:15 AM

△ [15a-F201-5] Characteristic of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers (5)
-Carbon cluster ion implantation-related defect formation analyzed by X-ray photoelectron spectroscopy-

〇TAKESHI KADONO¹, Ryosuke Okuyama¹, Ayumi Masada¹, Ryo Hirose¹, Satoshi Shigematsu¹, Yoshihiro Koga¹, Hidehiko Okuda¹, Kazunari Kurita¹ (1.SUMCO)