Kozo Nakamura

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Speaker, Author, Co-Author

Wed. Mar 15, 2017 9:00 AM - 12:15 PM F201 (F201)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal evaluation, impurities and crystal defects

[15a-F201-1~12] 15.7 Crystal evaluation, impurities and crystal defects

11:00 AM - 11:15 AM

[15a-F201-8] Behavior of point-defect-incorporation in ultra-high temperature RTP under oxygen atmosphere (II)

〇Kozo Nakamura¹, Hideyuki Okamura³, Susumu maeda³, Haruo Sudo³, Koji Sueoka² (1.Okayama Pref. Univ. Local Joint, 2.Okayama Pref. Univ. Commu., 3.GlobalWafers Japan)

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