Haruo Sudo

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Speaker, Author, Co-Author

Wed. Mar 15, 2017 9:00 AM - 12:15 PM F201 (F201)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal evaluation, impurities and crystal defects

[15a-F201-1~12] 15.7 Crystal evaluation, impurities and crystal defects

11:15 AM - 11:30 AM

[15a-F201-9] Investigation of annihilation behavior of void defects in Cz-Si wafers by ultra-high temperature RTP

〇Haruo Sudo¹, Kozo Nakamura³, Susumu Maeda¹, Hideyuki Okamura¹, Koji Sueoka² (1.GlobalWafers Japan, 2.Faculty of Computer Science and System Engineering, Okayama Prefectural Univ., 3.Regional Cooperative Research Organization, Okayama Prefectural Univ.)

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