Hitoshi Habuka

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Speaker, Author, Co-Author

Thu. Mar 16, 2017 9:00 AM - 12:15 PM E206 (E206)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[16a-E206-1~13] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

9:45 AM - 10:00 AM

[16a-E206-4] Minimal CVD Process with Minimum Materials Consumption

〇Hitoshi Habuka¹, Miya Matsuo¹, Ayami Yamada¹, Ning Li¹, Takanori Mikahara^2,3, Shin-ichi Ikeda^2,3, Yuuki Ishida^2,3, Shiro Hara^2,3 (1.Yokohama Nat. Univ., 2.MINIMAL, 3.AIST)

Wed. Mar 15, 2017 9:00 AM - 12:15 PM F204 (F204)

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[15a-F204-1~12] 15.6 Group IV Compound Semiconductors (SiC)

10:45 AM - 11:00 AM

[15a-F204-7] Anti-Corrosion of Pyrolytic Carbon Film for SiC Epitaxial Reactor Cleaning

Kohei Shioda¹, 〇Hitoshi Habuka¹, Hideki Ito², Shin-ichi Mitani², Yoshinao Takahashi³ (1.Yokohama Nat. Univ., 2.NuFlare Technology, 3.Kanto Denka Kogyo)

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