Taewoong Kim

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Speaker, Author, Co-Author

Wed. Mar 15, 2017 1:15 PM - 6:00 PM 304 (304)

Symposium (Oral)
| Symposium
| Highly reliable metallization technology for long term retention

[15p-304-1~10] Highly reliable metallization technology for long term retention

5:30 PM - 5:45 PM

[15p-304-9] Investigation of physical properties on ultra thin PVD-Co(W) barrier/liner layer to improve the reliability of ULSI intercconect

〇(PC)Taewoong Kim¹, Takeshi Momose¹, Akira Matsuo², Takuya Seino², Yukihiro Shimogaki¹ (1.The Univ. of Tokyo, 2.CANON ANELVA CORPORATION)