Shinichi Ikeda

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Speaker, Author, Co-Author

Thu. Mar 16, 2017 9:00 AM - 12:15 PM E206 (E206)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[16a-E206-1~13] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

10:00 AM - 10:15 AM

[16a-E206-5] Factor of the thickness distribution on the Minimal Si-CVD equipment

〇Shinichi Ikeda^1,2, Yuuki Ishida^1,2, Takanori Mikahara^1,2, Noriko Miura², Takahiro Ito³, Hitoshi Habuka⁴, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.ORIENTAL MOTOR, 4.YOKOHAMA National Univ.)

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