Takashi Oinoue

→ Search for Takashi Oinoue in Google Scholar

Speaker, Author, Co-Author

Thu. Mar 16, 2017 1:45 PM - 6:30 PM E206 (E206)

Oral presentation
| 13 Semiconductors
| 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[16p-E206-1~17] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

2:00 PM - 2:15 PM

[16p-E206-2] Behavior analysis of Si etching process with the HF/HNO₃ mixture by single spin wafer processor (2)

〇Takashi Oinoue¹, Suguru Saito², Atsushi Okuyama², Yoshiya Hagimoto², Hayato Iwamoto² (1.Sony Semiconductor Manufacturing, 2.Sony Semiconductor Solutions)

▲