Susumu Toko

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Speaker, Author, Co-Author

Tue. Mar 14, 2017 1:30 PM - 3:30 PM P1 (BP)

Poster presentation
| 8 Plasma Electronics
| 8 Plasma Electronics（Poster）

[14p-P1-1~25] 8 Plasma Electronics（Poster）

1:30 PM - 3:30 PM

[14p-P1-13] Dynamic behavior of radical deposition rate and amount of cluster incorporation into a-Si:H in the downstream region of multi-hollow discharge plasma CVD

〇Susumu Toko¹, Takashi Kojima¹, Kimitaka Keya¹, Kazuma Tanaka¹, Hyunwoohg Seo¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ.)

Fri. Mar 17, 2017 9:00 AM - 1:00 PM 315 (315)

Oral presentation
| 8 Plasma Electronics
| 8.3 Plasma deposition of thin film and surface treatment

[17a-315-1~15] 8.3 Plasma deposition of thin film and surface treatment

11:45 AM - 12:00 PM

[17a-315-11] Suppressing Si-H₂ bond formation at P/I interface of a-Si:H solar cells

〇Susumu Toko¹, Kazuma Tanaka¹, Takashi Kojima¹, Kimitaka Keya¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ.)

Fri. Mar 17, 2017 12:45 PM - 5:00 PM 313 (313)

Oral presentation
| 8 Plasma Electronics
| 8.7 Plasma phenomena, emerging area of plasmas and their new applications

[17p-313-1~16] 8.7 Plasma phenomena, emerging area of plasmas and their new applications

4:45 PM - 5:00 PM

△ [17p-313-16] Consideration of the methanation reactions of CO2 using plasma

〇Susumu Toko¹, Satoshi Tanida¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu University)

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