1:15 PM - 1:30 PM
△ [17p-304-2] Stability of ferroelectric phase in epitaxial HfO2-based films: RE2O3-HfO2 vs ZrO2-HfO2
〇Takanori Mimura1, Kiriha Katayama1, Takao Shimizu2, Takanori Kiguchi3, Akihiro Akama3, Toyohiko Konno3, Osami Sakata4, Hiroshi Funakubo1,2,5 (1.Tokyo Tech. IGS, 2.Tokyo Tech. MECS, 3.Tohoku Univ. IMR, 4.NIMS, 5.Tokyo Tech. DMSE)