[15a-P5-1~9] 6.4 Thin films and New materials

Wed. Mar 15, 2017 9:30 AM - 11:30 AM P5 (BP)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:30 AM - 11:30 AM

[15a-P5-1] Al₂O₃ films for anticorrosion coating on metal surfaces by room temperature atomic layer deposition

〇Kensaku Kanomata¹, Makoto Ishikawa¹, Masanori Miura¹, Bashir Ahmmad¹, Shigeru Kubota¹, Kazuhiro Hirahara¹, Fumihiko Hirose¹ (1.Yamagata Univ.)

9:30 AM - 11:30 AM

[15a-P5-2] The control of the crystal phase and characteristics in MoO_X thin films by the post-annealing under uniaxial compression

〇Ryotaro Nanba¹, Nobuo Tsuchimine², Satoru Kaneko^3,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech., 2.TOSHIMA Manu. Co., Ltd., 3.Kanagawa Ind. Tech. Center)

9:30 AM - 11:30 AM

[15a-P5-3] Preparation of the antimicrobial thin film using vacuum evaporation

〇Takashi Inomata¹ (1.KISAN KINZOKU)

9:30 AM - 11:30 AM

[15a-P5-4] Polarized luminescence property of non-polar ZnO thin films deposited by a catalytic reaction-assisted CVD method

〇Kanji Yasui¹, Ryouichi Tajima¹, Munenori Ikeda¹, Yudai Adachi¹, Ariyuki Kato¹ (1.Nagaoka Univ. Technol.)

9:30 AM - 11:30 AM

[15a-P5-5] Fabrication of Alq₃ tin films by mist vapor evaporation

〇(B)Tatsuki Matsushima¹, Shigetaka Katori¹, Masaya Oda², Toshimi Hitora² (1.National Institute of Technology, Tsuyama College, 2.FLOSFIA INC.)

9:30 AM - 11:30 AM

[15a-P5-6] Perfect Separation between Hybrid Orientation CeO₂ Regions on SOI Substrates

〇Tomoyasu Inoue¹, Shigenari Shida¹ (1.Iwaki Meisei Univ.)

9:30 AM - 11:30 AM

[15a-P5-7] Fabrication and characterization of BiVO₄ thin films using wet deposition method

〇(B)Yusuke Ohata¹ (1.Ryukoku Univ.)

9:30 AM - 11:30 AM

[15a-P5-8] The relation of formation and vaporizing temperature of ZnO whisker using atmospheric chemical vapor deposition

〇Naoki Kakuda¹, Keiji Komatsu², Hidetoshi Saitoh² (1.NIT, Yonago Colege, 2.Nagaoka Univ. Tech.)

9:30 AM - 11:30 AM

[15a-P5-9] Study on CBRAM using MOF thin film for memory layer

〇Yuki Nishimura¹, Takuya Nakamichi¹, Hiroshi Kajiro², Kentaro Kinoshita^1,3 (1.Tottori Univ, 2.Nippon Steel & Sumitomo Metal Co, 3.TiFREC)

Session information

[15a-P5-1~9] 6.4 Thin films and New materials

[15a-P5-1] Al₂O₃ films for anticorrosion coating on metal surfaces by room temperature atomic layer deposition

[15a-P5-2] The control of the crystal phase and characteristics in MoO_X thin films by the post-annealing under uniaxial compression

[15a-P5-3] Preparation of the antimicrobial thin film using vacuum evaporation

[15a-P5-4] Polarized luminescence property of non-polar ZnO thin films deposited by a catalytic reaction-assisted CVD method

[15a-P5-5] Fabrication of Alq₃ tin films by mist vapor evaporation

[15a-P5-6] Perfect Separation between Hybrid Orientation CeO₂ Regions on SOI Substrates

[15a-P5-7] Fabrication and characterization of BiVO₄ thin films using wet deposition method

[15a-P5-8] The relation of formation and vaporizing temperature of ZnO whisker using atmospheric chemical vapor deposition

[15a-P5-9] Study on CBRAM using MOF thin film for memory layer

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