Evaluation of TiO<sub>x</sub> ReRAM fabricated by reactive sputtering

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

Tue. Mar 14, 2017 9:00 AM - 11:30 AM 419 (419)

9:30 AM - 9:45 AM

〇Taiji Fukumoto¹, Reon Katsumura¹, Atsushi Tsurumaki-Fukuchi¹, Masashi Arita¹, Yasuo Takahashi¹ (1.Hokkaido Univ.)

Keywords:Semiconductor, ReRAM, TiOx