The 64th JSAP Spring Meeting, 2017

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[14a-503-1~12] 15.4 III-V-group nitride crystals

Tue. Mar 14, 2017 9:00 AM - 12:15 PM 503 (503)

Tsutomu Araki(Ritsumeikan Univ.), Jitsuo Ohta(Univ. of Tokyo)

11:30 AM - 11:45 AM

[14a-503-10] Growth of N-polar InN on Sapphire by DERI Method

〇(M1)Yuuto Kubonaka1, Shinichiro Mouri1, Tsutomu Araki1, Yasushi Nanishi1 (1.Ritsumeikan Univ)

Keywords:Indium nitride, N-polar, MBE

InN, a part of III-nitrides, is used future photonic and electronic devices because it has large mobility, high peak and saturation velocities and small direct bandgap. We reported new growth method of InN named droplet elimination by radical-beam irradiation (DERI) . These growth techniques improved InN quality.N-polar growth is possible to increase temperature (about 100℃) because N polarity is stable compared to the In polarity. I will report that N-polar InN is grown on sapphire substrate by DERI method.