The 64th JSAP Spring Meeting, 2017

Presentation information

Oral presentation

13 Semiconductors » 13.8 Compound and power electron devices and process technology

[14p-315-1~15] 13.8 Compound and power electron devices and process technology

Tue. Mar 14, 2017 1:15 PM - 5:15 PM 315 (315)

Kenji Shiojima(Univ. of Fukui), Kozo Makiyama(Fujitsu Lab.)

4:45 PM - 5:00 PM

[14p-315-14] fmax of 1.3 THz using extended drain-side recess structure in InP-based HEMTs

Tsuyoshi Takahashi1,2, Yoichi Kawano1,2, Kozo Makiyama1,2, Shoichi Shiba1, Masaru Sato1,2, Yasuhiro Nakasha1,2, Naoki Hara1,2 (1.Fujitsu Labs., 2.Fujitsu)

Keywords:HEMT, InP, fmax

A maximum frequency of oscillation (fmax) of 1.3 THz was achieved using an extended drain-side recess structure of InP-based HEMTs, although gate length was relatively long at 75 nm. Asymmetric gate recess structure and double-side doping above and below a channel region was effective in reducing the drain output conductance.