[14p-423-1~14] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[14p-423-11] Complex and Deepening OPC (Optical Proximity effect Correction) : High Speed Writing Data Processing by GPGPU and Reduction of OPC Placements by Quadruple Pattern Technology

〇Kazuya Kadota¹, Kokoro Koto² (1.Nano Science Lab, 2.Nihon Synopsys G.K.)

Keywords:Optical Proximity effect Correction, Mask data processing, Computational litography

To correspond the extremely fine patterning needs of semiconductors, the lithography and mask technologies of the sub 20 nm era are increasingly complicated and deepened in advanced exposure technologies such as immersion exposure, inverse lithography, multi-beam mask drawing, etc. Along with these needs, OPC method, and its optimization has become increasingly important. For this reason, chip layout design data becomes explosively enormous data including complicated OPCs, and reduction of processing burden at the mask writing and inspection has become an urgent pressing issue. In this research, we performed basic research to replace the conventional CPU processing method by using this graphic processor to make this mask data processing super speed. Furthermore, we studied Quadruple Pattern Technology which can reduce the number of OPC placements as much as possible. Moreover, it was confirmed by computer simulation that the device performance applying this QPT can maintain sufficient low voltage driving capability of 0.4 Vdd.