2:00 PM - 2:15 PM
[14p-423-4] Evaluation of exposure characteristics of positive tone resist for electron beam/photo lithography
Keywords:resist, electron beam/photo resist, exposure characteristics
Presentation information
Oral presentation
CS Code-sharing session » CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication
[14p-423-1~14] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication
Tue. Mar 14, 2017 1:15 PM - 5:00 PM 423 (423)
Shoji Hotta(Hitachi), Hiroki Yamamoto(Osaka Univ.)