Hironori Asada

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Speaker, Author, Co-Author

Tue. Mar 14, 2017 1:15 PM - 5:00 PM 423 (423)

Oral presentation
| CS Code-sharing session
| CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[14p-423-1~14] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

2:00 PM - 2:15 PM

[14p-423-4] Evaluation of exposure characteristics of positive tone resist for electron beam/photo lithography

Yukiko Kishimura¹, Shuai Zhang¹, 〇Hironori Asada¹ (1.Yamaguchi Univ.)