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CS Code-sharing session » CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[14p-423-1~14] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

Tue. Mar 14, 2017 1:15 PM - 5:00 PM 423 (423)

Shoji Hotta(Hitachi), Hiroki Yamamoto(Osaka Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:15 PM - 1:30 PM

[14p-423-1] Study on Reaction Mechanisms of Metal Resists

〇(M1)Satoshi Ishihara¹, Hiroki Yamamoto¹, Jelius Santillan², Toshiro Itani², Takahiro Kozawa¹ (1.ISIR, Osaka Univ., 2.EIDEC)

1:30 PM - 1:45 PM

△ [14p-423-2] Composition ratio dependence of exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene

〇Shunsuke Ochiai¹, Tomohiro Takayama¹, Yukiko Kishimura¹, Hironori Asada¹, Minako Iwakuma², Manae Sonoda², Ryoichi Hoshinno³ (1.Yamaguchi Univ., 2.NIT, Miyakonojo College, 3.FMS Inc.)

1:45 PM - 2:00 PM

[14p-423-3] Effect of addition of sulfones into chemically amplified resists

〇Kazumasa Okamoto^1,2, Shinya Fujii¹, Hiroki Yamamoto², Takahiro Kozawa², Toshiro Itani³ (1.Hokkaido Univ., 2.Osaka Univ., 3.EIDEC, Inc)

2:00 PM - 2:15 PM

[14p-423-4] Evaluation of exposure characteristics of positive tone resist for electron beam/photo lithography

Yukiko Kishimura¹, Shuai Zhang¹, 〇Hironori Asada¹ (1.Yamaguchi Univ.)

2:15 PM - 2:30 PM

△ [14p-423-5] Resist Investigation Method using Molecular Orbit Calculation

〇(M1)Shohei Nagata¹, Shota Niihara¹, Tetsuo Harada¹, Takeo Watanabe¹ (1.LASTI; Univ. of Hyogo)

2:30 PM - 2:45 PM

[14p-423-6] Lamellar Orientation of Block Copolymer via Electron-beam Induced Polarity Switch
in Nitrophenyl Self-assembled Monolayer

〇Hiroki Yamamoto¹, Guy Dawson², Alex P.G. Robinson², Takahiro Kozawa¹ (1.ISIR, Osaka Univ., 2.Univ.of Birmingham)

2:45 PM - 3:00 PM

[14p-423-7] Coarse-grain molecular dynamics simulation of lamellar phase of diblock copolymer in a bulk state

〇Toru Yamaguchi¹, Hirotaka Tanaka¹, Nicolas Clement¹, Aikira Fujiwara¹ (1.NTT BRL)

3:00 PM - 3:15 PM

[14p-423-8] Local nanopatterning by self-assembly/electron beam combined lithography

〇Reo Kometani¹, Kei Nishikawa¹, Etsuo Maeda¹ (1.The Univ. of Tokyo)

3:30 PM - 3:45 PM

[14p-423-9] Investigation of 2-variable 2nd-order Approximation Model on Line-and-space Pattern Formed by Electron Beam Exposure System

〇Masahito Kurouchi¹, Manabu Yasui¹, Takeshi Ozawa¹ (1.Kanagawa Ind. Tech. Center)

3:45 PM - 4:00 PM

△ [14p-423-10] Development of a wideband Mo/Si Multilayer mirror for EUV polarization control

〇(M1)Masanori Watanabe¹, Haruki Iguchi¹, Tetsuo Harada¹, Takeo Watanabe¹ (1.University of Hyogo)

4:00 PM - 4:15 PM

[14p-423-11] Complex and Deepening OPC (Optical Proximity effect Correction) : High Speed Writing Data Processing by GPGPU and Reduction of OPC Placements by Quadruple Pattern Technology

〇Kazuya Kadota¹, Kokoro Koto² (1.Nano Science Lab, 2.Nihon Synopsys G.K.)

4:15 PM - 4:30 PM

[14p-423-12] Homogenization of Patterning Characteristics in an Exposure Field of Projection Lithography
Using a Gradient-Index Lens Array

〇Toshiyuki Horiuchi¹, Takanori Sato¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

4:30 PM - 4:45 PM

[14p-423-13] Experimental study on 3D photolithography by Built-in lens mask

Toshiki Tanaka¹, Daiki Sugihara¹, Masaru Sasago¹, Hisao Kikuta¹, Hiroaki Kawata¹, 〇Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

4:45 PM - 5:00 PM

△ [14p-423-14] Fabrication of 3D Periodic Structures using ZnO Solution with Non-Vacuum Process

〇(D)Shinji Araki^1,2, Yasuaki Ishikawa¹, Xudongfang Wang¹, Mutsunori Uenuma¹, Donghwi Cho³, Seokwoo Jeon³, Yukiharu Uraoka¹ (1.NAIST, 2.JSPS Research Fellow, 3.KAIST)

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