Shunsuke Ochiai

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Speaker, Author, Co-Author

Tue. Mar 14, 2017 1:15 PM - 5:00 PM 423 (423)

Oral presentation
| CS Code-sharing session
| CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[14p-423-1~14] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

1:30 PM - 1:45 PM

△ [14p-423-2] Composition ratio dependence of exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene

〇Shunsuke Ochiai¹, Tomohiro Takayama¹, Yukiko Kishimura¹, Hironori Asada¹, Minako Iwakuma², Manae Sonoda², Ryoichi Hoshinno³ (1.Yamaguchi Univ., 2.NIT, Miyakonojo College, 3.FMS Inc.)

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