The 64th JSAP Spring Meeting, 2017

Presentation information

Oral presentation

CS Code-sharing session » CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[14p-424-1~16] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

Tue. Mar 14, 2017 1:15 PM - 5:30 PM 424 (424)

Tadahiro Kawasaki(JFCC), Katsuyoshi Miura(Osaka Univ.), Katsuhisa Murakami(AIST)

2:00 PM - 2:15 PM

[14p-424-4] Development of electrostatic Cs-corrector using annular and circular electrodes (ACE corrector)(4)

Tadahiro Kawasaki1,2, Takafumi Ishida2, Ryuji Yoshida1, Takeharu Kato1, Tetsuji Kodama3, Masahiro Tomita4, Takashi Ikuta5 (1.JFCC, 2.Nagoya Univ., 3.Meijo Univ., 4.Vac. Device, 5.OECU)

Keywords:Aberration correction, Electrostatic field, Optimal structure

A new shperical aberration correction device with electrostatic field has developed for improving spatial resolution in electron microscopes. In this study, we have reported that influences of supporting bridges in the electrode on the electrostatic field and the optimal structure of the electrode to minimize the effect.