[14p-P3-1~19] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[14p-P3-3] Fabrication of carbonnano materials by supercritical fluid
using ultrafine metal particle method for LSI interconnect applications

〇kei nisikawa¹, Yoshio Uhara¹, Masatoshi Itoh¹, Sigeru Saito¹ (1.Tokyo.Univ.of Science)

Keywords:Supercritical fluid, Carbon nano material, LSI interconnect