[14p-P3-1~19] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[14p-P3-5] CNM fabrication for LSI interconnect using supercritical ethanol

〇Seren Maeda¹, Rinnosuke Umeda¹, Takumi Tamane¹, Tomoki Huruichi¹, Toshio Uhara¹, Masatoshi Itoh¹, Shigeru Saito¹ (1.Tokyo Univ. of science)

Keywords:supercritical ethanol, Carbon nanomaterial, LSI interconnect