[14p-P4-1~78] 17 Nanocarbon Technology（Poster）

[14p-P4-30] Ellipsometric monitoring and analysis of graphene growth in plasma enhanced chemical vapor deposition

〇Yasuaki Hayashi¹, Satoshi Ishidoshiro¹, Shunya Yamada¹, Yuma Kawamura¹ (1.Kyoto Inst. Tech.)

Keywords:graphene, ellipsometry, plasma enhanced chemical vapor deposition

Laer-ellipsometric monitorig was carried out during the growth of graphene in plasma enhanced chemical vapor deposition. It has been found that graphene first grows in the direction of substrate surface and next grows in the perpendicular direction. The change occurs later under the condition of lower gas pressure (10 Pa) than higher pressure (200Pa).