The 64th JSAP Spring Meeting, 2017

Presentation information

Oral presentation

13 Semiconductors » 13.6 Semiconductor English Session

[15a-513-1~8] 13.6 Semiconductor English Session

Wed. Mar 15, 2017 9:00 AM - 11:15 AM 513 (513)

Takashi Kunimoto(Tokushima Bunri Univ.), Masato Koyama(TOSHIBA)

10:00 AM - 10:15 AM

[15a-513-5] Breakdown Voltage Instability in nLDMOS Transistors

Jone F Chen1, Ya-Sheng Feng1 (1.National Cheng Kung Univ.)

Keywords:LDMOS transistor, breakdown voltage

Hot-carrier induced drain breakdown voltage instability in n-type lateral diffused metal-oxide-semiconductor (LDMOS) transistors is investigated. Based on charge pumping measurement data and technology computer-aided-design simulation results, hot-carrier induced interface states generated at the accumulation region is proposed to be the root cause of the breakdown voltage instability.