The 64th JSAP Spring Meeting, 2017

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[15a-F204-1~12] 15.6 Group IV Compound Semiconductors (SiC)

Wed. Mar 15, 2017 9:00 AM - 12:15 PM F204 (F204)

Yukari Ishikawa(JFCC)

9:45 AM - 10:00 AM

[15a-F204-4] SiC solution growth under controlled with the shape of solution by X-ray transmission method

Takenobu Sakai1, Motohisa Kado2, Hironori Daikoku2, Shunta Harada3, Toru Ujihara3 (1.Nagoya Univ. Inst. of Inno. for Fut. Soc., 2.TOYOTA Mot. Corpo., 3.Nagoya Univ. Inst. of Mate. and Syst. for Susta.)

Keywords:4H-SiC, solution growth, in-situ observation

We have developed in-situ observation techniques by X-ray transmission method during the crystal growth. The observations were carried out from the side of the graphite crucible transmitted through the X-ray under the condition of 80~140 kV×2 mA. Then, we tried to keep the meniscus heights for 2 mm during the crystal growth. Therefore, we have 4H-SiC crystal as a same of seed crystal. This shows that it is effective to make high quality crystals.