[15a-P5-1~9] 6.4 Thin films and New materials

[15a-P5-5] Fabrication of Alq₃ tin films by mist vapor evaporation

〇(B)Tatsuki Matsushima¹, Shigetaka Katori¹, Masaya Oda², Toshimi Hitora² (1.National Institute of Technology, Tsuyama College, 2.FLOSFIA INC.)

Keywords:Thin film new technology

Tris (8-quinolinolato) aluminum (Alq ₃) is known as a light emitting material for organic EL and plays a very important role in the modern organic EL industry. Vacuum evaporation method and the like are often used for the organic EL device film formation process. The vacuum evaporation method is generally used as a manufacturing process of low molecular organic EL. However, there is a problem that the vacuum apparatus is large-scaled, consumes large power, and the film-forming cost increases. There is a mist method in which a material solution is atomized by an ultrasonic vibrator and sprayed onto a substrate with an inert gas to deposit on a substrate to form a thin film. However, the grain size of the mist sprayed is large, when depositing different materials, there was a drawback that the base was melted. In this study, Alq 3 was used as a solute and 2-pyrrolidinone was used as a solvent. Both of these materials were atomized by ultrasonic waves, blown to a fixed position using a carrier gas and deposited on the substrate. The fluorescence spectrum of the obtained thin film was evaluated.