The 64th JSAP Spring Meeting, 2017

Presentation information

Symposium (Oral)

Symposium » Highly reliable metallization technology for long term retention

[15p-304-1~10] Highly reliable metallization technology for long term retention

Wed. Mar 15, 2017 1:15 PM - 6:00 PM 304 (304)

Shinji Yokogawa(UEC), Eiichi Kondoh(U. Yamanashi)

1:30 PM - 2:15 PM

[15p-304-2] Huge-potential need to the memory-system for ultra-long term preservation and its issues

Toshio Kobayashi1 (1.Shibaura Inst.h Lab.)

Keywords:Memory, Long-term, Preservation

Digital technology is very popular now in our life due to its convenience and power. On the other hand, it makes rise to threat against long-term preservation of the memories and data. The amount of data generated increases to explosion therefore the amount of data which should be preserved is also dramatically increasing accordingly. Now it is time to discuss the technology that enables us long-term preservation at an affordable cost. Semiconductor nonvolatile memory technology may be able to solve this problem. The biggest issue is ultra-long-term reliability of the wiring. There is huge latent demand for ultra-long-term preservation memory therefore there is huge market.