[15p-304-1~10] Highly reliable metallization technology for long term retention

[15p-304-9] Investigation of physical properties on ultra thin PVD-Co(W) barrier/liner layer to improve the reliability of ULSI intercconect

〇(PC)Taewoong Kim¹, Takeshi Momose¹, Akira Matsuo², Takuya Seino², Yukihiro Shimogaki¹ (1.The Univ. of Tokyo, 2.CANON ANELVA CORPORATION)

Keywords:PVD-Co(W), barrier/liner single layer, reliability of Cu metallization