[15p-412-1~18] 6.2 Carbon-based thin films

[15p-412-12] Formation of DLC and BN films by Pulsed Discharge Plasma CVD

〇Mikio Noda¹, Isao Horibe² (1.Pulse Plasma Tech., 2.Lightec Lab.)

Keywords:thin film, plasma CVD, pulsed discharge

Power source for bipolar pulsed discharge was fabricated, and formation of DLC film at low temperature of about 470 K was performed by plasma CVD method. Formation of BN film at about 770 K was also performed. By means of the discharge changes from monopolar to bipolar, where residual charge on the surface was diminished by opposite polar discharge, stable discharge was continued. Phenomena of arcing and diminish of glow were also prevented. By this method, the films having about 11 Gpa hardness could be formed.