The 64th JSAP Spring Meeting, 2017

Presentation information

Symposium (Oral)

Symposium » Progress and outlook of nanoimprint technology

[15p-512-1~9] Progress and outlook of nanoimprint technology

Wed. Mar 15, 2017 1:30 PM - 6:00 PM 512 (512)

Atsushi Yokoo(NTT), Hiroshi Hiroshima(AIST)

4:15 PM - 4:45 PM

[15p-512-5] Progress of roll to roll nanoimprint lithography and next generation target

Jun Taniguchi1 (1.Tokyo Univ. of Sci.)

Keywords:roll to roll nanoimprint lithography, roll mold, UV curable resin

Roll to roll nanoimprint lithography can make the nano scale patterns with high throughput. In this paper, the historical and development of RTR-NIL are explain. In addition, next generation targets are overviewed.