[15p-512-1~9] Progress and outlook of nanoimprint technology

[15p-512-4] Nano imprint lithography appling for semiconductor devices

〇Tatsuhiko Higashiki^1,2 (1.TOSHIBA, 2.NuFlare)

Keywords:semiconductor, nano imprint, lithography

We have been studying nano imprint lithography called NIL that print device patterns on the template to silicon wafer directory. NIL had some subjects such as overlay accuracy and defect control. In this paper, I will talk about NIL technology updates and applying to semiconductor devices in production line.