[15p-512-1~9] Progress and outlook of nanoimprint technology

[15p-512-3] Computational Study of Resist Molecular Behavior in Nanoimprint Lithography

〇Masaaki Yasuda¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

Keywords:nanoimprint, molecular dynamics, molecular behavior

In order to achieve precise pattern transfer in nanoimprint lithography, understanding the deformation process of the resist is essential. When the pattern size becomes below several tens of nanometer, the behaviors of the polymer molecule plays an important roll to determine the pattern shape. In the present work, we study the nanoimprint process with molecular dynamics simulations. The molecular size effects on the press and demolding forces are investigated from the perspective of the molecular behavior during the nanoimprint process.