[15p-P11-1~11] 7 Beam Technology and Nanofabrication（Poster）

[15p-P11-3] Development of bucket type RF ion sources for large area ion beam milling

〇Masanobu Tanaka¹ (1.Kumamoto Univ.)

Keywords:Ion source, RF, Ion beam milling

In the ion beam milling apparatus, an ion beam with a max diameter of 580 mm is extracted from a bucket type ion source and applied to semiconductor wiring / electrode process, microfabrication of magnetic heads, printer heads and MEMS. In this report, we will show a bucket type RF ion source developed for hundreds hours continuous operation. Ar ⁺ beam of 1 keV, 300 mm diameter, 1 mA / cm ² current density was obtained. Active ion species like Oxygen are also possible.