[15p-P3-1~26] 6.3 Oxide electronics

[15p-P3-2] Fabrication of BiFeO₃ thin films by Atomic Layer Deposition

〇(M1C)Mitsuhiro Hirabayashi¹, Aoi Nakamura¹, Shanghao Zha¹, Naoki Shimosako¹, Hiroshi Sakama¹ (1.Sophia Univ.)

Keywords:bismuth ferrite, atomic layer deposition, thin film

Since BiFeO₃ (BFO) is expected as a ferroelectric memory material. In this study, we tried to fabricate BFO thin films on SrTiO₃ (100) (STO) substrates using atomic layer deposition (ALD) which is rich in homogeneity and can obtain thin films with few defects. As a result, it is found that BFO (100) mainly grew selectively on STO (100).