[15p-P7-1~5] 15.5 Group IV crystals and alloys

[15p-P7-5] Evaluation of low-temperature deposition process of SiGeHEMT by Sputter Epitaxy Method

〇Katsumi Okubo¹, Motohashi Akira¹, Degura Kyouhei¹, Hirose Nobumitsu², Kasamatsu Akifumi², Matsui Toshiaki², Tsukamoto Takahiro¹, Suda Yoshiyuki¹ (1.Tokyo Univ. of Agric. & Technol., 2.National Inst. of Information and Communications Technol)

Keywords:SiGe, HEMT, Sputter Epitaxy