[16a-P4-1~29] 13.8 Compound and power electron devices and process technology

△ [16a-P4-8] Deposition and characterization of silicon dioxide film formed by surface-wave plasma enhanced chemical vapor deposition

〇Makoto Baba¹, Kondo Yutaka¹, Okada Hiroshi^2,1, Furukawa Masakazu³, Yamane Keisuke¹, Sekiguchi Hiroto¹, Wakahara Akihiro^1,2 (1.Toyohashi Univ.Tech, 2.EIIRIS, 3.ARLC)

Keywords:surface-wave plasma, CVD, silicon dioxide