[16p-315-1~11] GFIS（電界電離ガスイオン源）ガスイオン顕微鏡技術とその材料・デバイス研究開発への応用：現状と今後の展望

▲ [16p-315-3] Mask Repair Technology using Gas Field Ion Source

〇八坂 行人^1,2、荒巻 文朗¹、小堺 智一¹、松田 修¹ (1.日立ハイテクサイエンス、2.日立ハイテクノロジーズ)

キーワード：focused ion beam, gas field ion source, mask repair

We developed a new ion beam based mask repair system using a gas field ion source (GFIS). For conventional photomasks, nitrogen ions were used to repair defects, while hydrogen ions were used for EUVL masks. We evaluated the performance of the mask repair system on MoSi based phase shift masks and EUV masks. The results demonstrate that GFIS technology is a reliable solution of repairing defects on high end photomasks for 1Xnm generation and beyond.