The 64th JSAP Spring Meeting, 2017

Presentation information

Oral presentation

17 Nanocarbon Technology » 17.3 Layered materials

[16p-F203-1~15] 17.3 Layered materials

Thu. Mar 16, 2017 1:45 PM - 6:00 PM F203 (F203)

Keiji Ueno(Saitama Univ.), Kenzo Maehashi(TUAT)

5:00 PM - 5:15 PM

[16p-F203-12] Random telegraph signal in the time-dependent dielectric breakdown test for h-BN

Yoshiaki Hattori1, Takashi Taniguchi2, Kenji Watanabe2, Kosuke Nagashio1,3 (1.Tokyo Univ., 2.NIMS, 3.PRESTO-JST)

Keywords:hexagonal boron nitride, dielectric breakdown

Hexagonal boron nitride (h-BN) is considered as ideal layered insulator for graphene and other 2D material devises. In this research, the constant-voltage-stress was applied to the h-BN to clarify the degradation mechanism against the electrical stress. The h-BN endured the strong electrical field which is 75% of the dielectric breakdown strength for 1 hour. In addition, we have found that the current measured in the test is the random telegraph noise.